Ion Electronic Materials Co., Ltd. Stock

Ion Electronic Materials Co Ltd is engaged in the provision of specialty gases and machineries. The Company's businesses include the production and sales of special gases and machineries. Special gases include dopant gas, clean and etchant gas, CVD thin-film gas and laser litho gas. Dopant gas are used as special gases for semiconductor ion implantation process and after implantation, including arsine, phosphine, boron trifluoride (11B), 11B enriched boron trifluoride and germanium tetrafluoride. Clean and etchant gas are nitrogen trifluoride, used as cleaning gas in semiconductors and liquid crystal panels, as well as F2/N2 Mixture Gas, used in electronics, laser technology and medical equipment. CVD thin-film gas includes SiH4, Si2H6, DCS and TCS used in semiconductor. Laser litho gas includes ArF193nm, KrF248nm, laser annealing gas, Ne and Kr used in photoresist process. Machineries are used for special gas refilling.